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Abstract

The study of the possibility of removing organic compounds from wastewater originating from the biodiesel purification stage by two catalytic processes, HSO5-/transition metal and Fenton method has been presented. The source of the ion HSO5- is potassium monopersulphate (2KHSO5·KHSO4·K2SO4) (Oxone) that may be decomposed into radicals (OH., SO4-., SO5-.) by means of transition metal as Co(II). Different concentrations were used for both compounds and the combination ([Co2+] = 1.00μM/[HSO5-] = 5.00·10-2 M) achieved the highest COD removal (60%) and complete decomposition of the oxidant was verified for contact times of 45 min. This process has some advantages comparing to the conventional Fenton method such as the absence of the costly pH adjustment and the Fe(III) hydroxide sludge which characterize this treatment process. The Fenton process showed that the combination of [H2O2] = 2.00M/[Fe2+] = 0.70 M was the best and archived COD removal of 80%. The treatments studied in this research have achieved high COD removal, but the wastewater from the biodiesel purification stage presents very high parametric values of Chemical Oxygen Demand (667,000 mgO2/L), so the final COD concentration reached is still above the emission limit of discharge in surface water, according the Portuguese Law (Decree-Law 236/98). However, both treatments have proved to be feasible techniques for the pre-oxidation of the wastewater under study and can be considered as a suitable pre-treatment for this type of wastewaters. A rough economic analysis of both processes was, also, made.
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Abstract

The possibility of removing organic compounds from wastewater originating from the photochemical production of printed circuit boards by use of waste acidification and disposal of precipitated photopolymer in the first stage and the UV-Fenton method in a second stage has been presented. To optimize the process of advanced oxidation, the RSM (Response Surface Methodology) for three independent factors was applied, i.e. pH, the concentration of Fe(II) and H2O2 concentration. The use of optimized values of individual parameters in the process of wastewater treatment caused a decrease in the concentration of the organic compounds denoted as COD by approx. 87% in the first stage and approx. 98% after application of both processes. Precipitation and the decomposition of organic compounds was associated with a decrease of wastewater COD to below 100 mg O2/L whereas the initial value was 5550 mg O2/L. Decomposition of organic compounds and verification of the developed model of photopolymers removal was also carried out with use of alternative H2O2 sources i.e. CaO2, MgO2, and Na2CO3·1,5H2O2.
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Abstract

Surfactants after their use are discharged into aquatic ecosystems. These compounds may be harmful to fauna and flora in surface waters or can be toxic for microorganisms of the activated sludge or biofilm in WWTP. In order to determine effectiveness of different advanced oxidation processes on the degradation of surfactants, in this study the degradation of anionic surfactants in aqueous solution using photolysis by 254 nm irradiation and by advanced oxidation process in a H2O2/UVC system was investigated. Two representatives of anionic surfactants, linear alkyl benzene sulphonate (LAS-R11–14) and ether carboxylic derivate (EC-R12–14E10) were tested. The influence of pH, initial surfactant concentration and dose of hydrogen peroxide on the degradation was also studied. Results show outstanding effectiveness of the H2O2/UVC system in the removal of surfactant from aqueous solutions.
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