On the basis of the presented studies, it was established that seed dressing by coating protects effectively onion crops against onion fly (Hylemyia antiqua Meig.). In all seed dressing treatments, a significant decrease of number of dam- aged plants was found in comparison to the control. The highest efficacy in protection of onion against onion fly was shown in the case of insecticide Super Homai 70 DS. The effectiveness of this seed dressing reached 80.40% in the year 2001 and 85.44% in the year 2002.

In this work we report on fabrication of quantum wires and quantum point contacts from the modulation doped CdMgTe/Cd(Mn)Te structures, with the application of a high-resolution electron-beam lithography. We emphasize on methods which were not yet utilized for these substrate materials. In particular, we describe the so-called shallow-etching approach, which allows for the fabrication of quantum constrictions of a physical width down to 100 nm, which are characterized by the smoother confining potential as compared to the deep-etched devices. For that purpose, a single-line exposure mode of electron-beam lithography has been used. We demonstrate also, how to combine the etching of separating grooves with the thermal evaporation of metal side-gates into a single post-processing stage of a quantum point contact fabrication.

This article is an expanded version of the scientific reports presented at the International Conference on Semiconductor Nanostructures for Optoelectronics and Biosensors 2016 ICSeNOB2016, May 22–25, 2016, Rzeszow, Poland.