The performance of HgCdTe barrier detectors with cut-off wavelengths up to 3.6 μm fabricated using metaloorganic chemi- cal vapour deposition operated at high temperatures is presented. The detectors’ architecture consists of four layers: cap contact, wide bandgap barrier, absorber and bottom contact layer. The structures were fabricated both with n- and p-type absorbing layers. In the paper, different design of cap-barrier structural unit (n-B_p′, n⁺-B_p′, p+-B_p) were analysed in terms of various electrical and optical properties of the detectors, such as dark current, current responsivity time constant and detectivity.

The devices with a p-type cap contact exhibit very low dark current densities in the range of (2÷3)×10^-4 A/cm² at 230 K and the maximum photoresponse of about 2 A/W in wide range of reverse bias voltage. The time constant of measured de- vices with n-type cap contact and p-type absorbing drops below 1 ns with reverse bias while the detectivity is at the level of 1010 cm ^∙ Hz1/2/W.

A method for defects extraction for a mercury cadmium telluride (MCT) multilayer low-bandgap heterostructure is presented. The N⁺/T/p/T/P⁺/n⁺ epitaxial layer was deposited on a GaAs substrate by a metal-organic chemical vapour deposition (MOCVD). The absorber was optimized for a cut-off wavelength of λ_c = 6 μm at 230 K. Deep-level transient spectroscopy (DLTS) measurements were conducted for the isolated junctions of the N⁺/T/p/T/P⁺/n⁺ heterostructure. Three localised point defects were extracted within the p-type active layer. Two of them were identified as electron traps and one as a hole trap, respectively.

In the paper recent progress at VIGO/MUT (Military University of Technology) MOCVD Laboratory in the growth of Hg1-xCdxTe (HgCdTe) multilayer heterostructures on GaAs/CdTe substrates is presented. The optimum conditions for the growth of single layers and complex multilayer heterostructures have been established. One of the crucial stages of HgCdTe epitaxy is CdTe nucleation on GaAs substrate. Successful composite substrates have been obtained with suitable substrate preparation, liner and susceptor treatment, proper control of background fluxes and appropriate nucleation conditions. The other critical stage is the interdiffused multilayer process (IMP). The growth of device-quality HgCdTe heterostructures requires complete homogenization of CdTe-HgTe pairs preserving at the same time suitable sharpness of composition and doping profiles. This requires for IMP pairs to be very thin and grown in a short time.

Arsenic and iodine have been used for acceptor and donor doping. Suitable growth conditions and post growth anneal is essential for stable and reproducible doping. In situ anneal seems to be sufficient for iodine doping at any required level. In contrast, efficient As doping with near 100% activation requires ex situ anneal at near saturated mercury vapours. As a result we are able to grow multilayer fully doped (100) and (111) heterostructures for various infrared devices including photoconductors, photoelectromagnetic and photovoltaic detectors. The present generation of uncooled long wavelength infrared devices is based on multijunction photovoltaic devices. The technology steps in fabrication of devices are described. It is shown that near-BLIP performance is possible to achieve at ≈ 230 K with optical immersion. These devices are especially promising as 7.8–9.5 um detectors, indicating the potential for achieving detectivities above 109 cmHz1/2/W.