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Abstract

The technology of manufacturing silicon solar cells is complex and consists of several stages. The final steps in succession are the deposition of antireflection layer and discharge contacts. Metallic contacts are usually deposited by the screen printing method and then, fired at high temperature. Therefore, this article presents the results of a research on the effect of heat treatment on the properties of the Al2O3 thin film previously deposited by the atomic layer deposition method. It works well as both passivating and antireflection coating. Moreover, heat treatment affects the value of the cell short-circuit current and, thus, its efficiency. The surface morphology, optical and electrical properties were investigated, describing the influence of heat treatment on the properties of the deposited layers and the manufactured solar cells.
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Bibliography

  1. Marks-Bielska, R. et al. The importance of renewable energy sources in Poland’s energy Energies 13, 1–23 (2020). https://doi.org/10.3390/en13184624
  2. Asfar, Y. et al. Evaluating Photovoltaic Performance Indoors. in 2012 38th IEEE Photovoltaic Specialists Conference (PVSC). 1948–1951 (IEEE, Austin, USA 2012).
  3. Ranjan, S. et al. Silicon solar cell production. Comput. Chem. Eng. 35, 1439–1453 (2011). https://doi.org/10.1016/j.compchemeng.2011.04.017
  4. Drygala, A. et al. Influence of laser texturization surface and atomic layer deposition on optical properties of polycrystalline silicon. Int. J. Hydrog. Energy 41, 7563–7567 (2016). https://doi.org/10.1016/j.ijhydene.2015.12.180
  5. Hou, G., Garcia, I. & Rey-Stolle, I. High-low refractive index stacks for broadband antireflection coatings for multijunction solar cells. Sol. Energy 217, 29–39 (2021). https://doi.org/10.1016/j.solener.2021.01.060
  6. Dobrzański, L. A., Szindler, M., Drygała, A. & Szindler, M.M., Silicon solar cells with Al2O3 antireflection coating. Cen. Eur. J. Phys. 12, 666–670 (2014). https://doi.org/10.2478/s11534-014-0500-9
  7. Sarkar, S. & Pradhan, S. K. Silica-based antireflection coating by glancing angle deposition. Surf. Eng. 35, 982–985. (2019). https://doi.org/10.1080/02670844.2019.1596578
  8. Szindler, M. Szindler, M. M., Boryło, P. & Jung, T. Structure and optical properties of TiO2 thin films deposited by ALD Open Phys. 15, 1067–1071 (2017). https://doi.org/10.1515/phys-2017-0137
  9. Król, K. et al. Influence of atomic layer deposition temperature on the electrical properties of Al/ZrO2/SiO2/4H-SiC metal-oxide semiconductor structures. Phys. Status Solidi (A) 215, 1–7 (2018). https://doi.org/10.1002/pssa.201700882
  10. Boryło, P. et al. Structure and properties of Al2O3 thin films deposited by ALD proces. Vacuum 131, 319–326 (2016). https://doi.org/10.1016/j.vacuum.2016.07.013
  11. Drabczyk, K. et al. Comparison of diffused layer prepared using liquid dopant solutions and pastes for solar cell with screen printed electrodes. Microelectron. Int. 33, 167–171 (2016). https://doi.org/10.1108/MI-03-2016-0031
  12. Öğütman, K. et al. Spatial atomic layer deposition of aluminum oxide as a passivating hole contact for silicon solar Phys. Status Solidi (A) 217, 1–6 (2020). https://doi.org/10.1002/pssa.202000348
  13. Drabczyk, K. et al. Electroluminescence imaging for determining the influence of metallization parameters for solar cell metal contacts. Sol. Energy 126, 14–21 (2016). https://doi.org/10.1016/j.solener.2015.12.029
  14. Park, H. H. Inorganic materials by atomic layer deposition for perovskite solar cells. Nanomaterials 11, 1–22 (2021). https://doi.org/10.3390/nano11010088
  15. Hossain, A. et al. Atomic layer deposition enabling higher efficiency solar cells: A review. Nano Materials 2, 204–226 (2020). https://doi.org/10.1016/j.nanoms.2019.10.001
  16. Werner, F. et al. High-rate atomic layer deposition of Al2O3 for the surface passivation of Si solar cells. Energy Procedia 8, 301–306 (2011). https://doi.org/10.1016/j.egypro.2011.06.140
  17. Werner, F., Cosceev, A. & Schmidt, J. Silicon surface passivation by Al2O3: Recombination parameters and inversion layer solar cells. Energy Procedia 27, 319–324 (2012). https://doi.org/10.1016/j.egypro.2012.07.070
  18. Swatowska, B. Antireflective and passivation properties of the photovoltaic structure with Al2O3 layer of different thickness. Microelectron. Int. 35, 177–180 (2018). https://doi.org/10.1108/MI-04-2018-0020
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Authors and Affiliations

Marek Szindler
1
ORCID: ORCID
Magdalena M. Szindler
2
ORCID: ORCID

  1. Scientific and Didactic Laboratory of Nanotechnology and Material Technologies, Faculty of Mechanical Engineering, Silesian University of Technology, 7 Towarowa St., 44-100 Gliwice, Poland
  2. Department of Engineering Materials and Biomaterials, Faculty of Mechanical Engineering, Silesian University of Technology, 18a Konarskiego St., 44-100 Gliwice, Poland
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Abstract

Al 2O 3/TiO 2 thin films were deposited onto monocrystalline silicon surfaces using an atomic layer deposition. Their surface morphology and optical properties were examined for their possible use in solar cells. The surface condition and chemical composition were characterized using a scanning electron microscope and the thickness was measured using a spectroscopic reflectometer. The refractive index and the reflection characteristics were determined. First, the optical properties of the Al 2O 3 thin film and its influence on recombination in the semiconductor were examined. In this way, it can fulfil a double role in a solar cell. Since reflection reduction was only achieved in a narrow range, it was decided to use the Al 2O 3/TiO 2 system. Thanks to this solution, the light reflection was reduced in a wide range (even below 0.2%).
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Authors and Affiliations

Marek Szindler
1
ORCID: ORCID
Magdalena M. Szindler
2
ORCID: ORCID
Justyna Orwat
3
ORCID: ORCID
Grażyna Kulesza-Matlak
4
ORCID: ORCID

  1. Scientific and Didactic Laboratory of Nanotechnology and Material Technologies, Faculty of Mechanical Engineering, Silesian University of Technology, 7 Towarowa St., 44-100 Gliwice, Poland
  2. Department of Engineering Materials and Biomaterials, Silesian University of Technology, 18a Konarskiego St., 44-100 Gliwice, Poland
  3. Department of Mining, Safety Engineering and Industrial Automation, Silesian University of Technology, 2 Akademicka St., 44-100 Gliwice, Poland
  4. Institute of Metallurgy and Materials Science of Polish Academy of Sciences, 25 Reymonta St., 30-059 Krakow, Poland

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