The double barrier separate confinement heterostructure (DBSCH) design aimed at reduction of vertical beam divergence and increase of catastrophic optical damage (COD) level for high power laser diodes (LDs) operation is presented. Insertion of thin, wide-gap barrier layers at the interfaces between waveguide and cladding layers of SCH gives an additional degree of freedom in design making possible more precise shaping of the optical field distribution in the laser cavity. By comparison with the large optical cavity (LOC) heterostructure design it has been shown that the low beam divergence emission of DBSCH LDs can be attributed to the soft-profiled field distribution inside the cavity. This ‘soft mode profile’ seems to determine narrow laser beam emission rather than the field distribution width itself.
The potential problem with the soft-profiled but relatively narrow (at half-maximum) mode distribution is a lower COD level. Widening of the mode profile by the heterostructure design corrections can increase it, but care must be taken to avoid excessive decrease of confinement factor (Γ). As a result it is shown that DBSCH design is possible, where the low beam divergence and high COD level is achieved simultaneously.
Wide stripe gain-guided LDs based on GaAsP/AlGaAs DBSCH SQW structures have been manufactured according to the design above. Gaussian-shaped narrow directional characteristics are in relatively good agreement with modelling predictions. Vertical beam divergences are 13–15◦ and 17–18◦ FWHM for design versions experimentally investigated. Threshold current densities of the order of 350–270 Acm-2 and slope efficiencies of 0.95 and 1.15 W/A have been recorded for these two versions, respectively. Optical power at the level of 1 W has been achieved. The version with lower beam divergence proves to be more durable. Higher optical power levels are to be obtained after heterostructure doping optimisation.
In recent years, GaN-based light-emitting diode (LED) has been widely used in various applications, such as RGB lighting system, full-colour display and visible-light communication. However, the internal quantum efficiency (IQE) of green LEDs is significantly lower than that of other visible spectrum LED. This phenomenon is called “green gap”. This paper briefly describes the physical mechanism of the low IQE for InGaN/GaN multiple quantum well (MQW) green LED at first. The IQE of green LED is limited by the defects and the internal electric field in MQW. Subsequently, we discuss the recent progress in improving the IQE of green LED in detail. These strategies can be divided into two categories. Some of these methods were proposed to enhance crystal quality of InGaN/GaN MQW with high In composition and low density of defects by modifying the growth conditions. Other methods focused on increasing electron-hole wave function overlap by eliminating the polarization effect.
Photoelectrical characteristics of scanning IR detectors with implemented time delay and integration mode are analyzed. A new “shifted cellular” layout of photosensitive elements in the FPA structure is proposed. Advantages of the new FPA configuration in terms of threshold sensitivity for small-size/point objects are demonstrated. The analysis is based on the Monte Carlo simulation of the diffusion process of photogenerated minority charge carriers in the photosensitive layer photodiode arrays. The analysis is performed taking into account the main photoelectric parameters of FPA elements: photosensitive layer thickness, diffusion length of charge carriers, optical absorption length, their design parameters: geometric sizes of FPA elements, diameters of p-n junctions, and design parameters of the optical system: optical-spot diameter.
In this paper, a low power highly sensitive Triple Metal Surrounding Gate (TM-SG) Nanowire MOSFET photosensor is proposed which uses triple metal gates for controlling short channel effects and III–V compound as the channel material for effective photonic absorption. Most of the conventional FET based photosensors that are available use threshold voltage as the parameter for sensitivity comparison but in this proposed sensor on being exposed to light there is a substantial increase in conductance of the GaAs channel underneath and, thereby change in the subthreshold current under exposure is used as a sensitivity parameter (i.e., Iillumination/IDark). In order to further enhance the device performance it is coated with a shell of AlxGa1-xAs which effectively passivates the GaAs surface and provides a better carrier confinement at the interface results in an increased photoabsorption. At last performance parameters of TM-SG Bare GaAs Nanowire MOSFET are compared with TM-SG core-shell GaAs/AlGaAs Nanowire MOSFET and the results show that Core-Shell structures can be a better choice for photodetection in visible region.