@ARTICLE{Szindler_Marek_Application_2023,
 author={Szindler, Marek and Szindler, Magdalena M.},
 volume={31},
 number={4},
 journal={Opto-Electronics Review},
 pages={e148223},
 howpublished={online},
 year={2023},
 publisher={Polish Academy of Sciences (under the auspices of the Committee on Electronics and Telecommunication) and Association of Polish Electrical Engineers in cooperation with Military University of Technology},
 abstract={The article describes the results of a research on the surface morphology and optical properties of Al 2O 3, ZnO, and TiO 2 thin films deposited by atomic layer deposition (ALD) for applications in silicon solar cells. The surface topography and elemental composition were characterised using a scanning electron microscope, and thickness was determined using an optical reflectometer. The samples were structurally examined using a Raman spectrometer. The structural variant was identified: for Al 2O 3 it is sapphire, for TiO 2 it is anatase, and for ZnO it is wurtzite. Possibilities of minimising light reflection using single and double thin film systems below 5% were presented. For the first time, the effectiveness of these thin films on the current-voltage characteristics and electrical parameters of manufactured silicon solar cells was examined and compared. The solar cell with the highest efficiency of converting solar radiation into electricity was obtained for Al 2O 3/TiO 2 and the efficiency of such a photovoltaic device was 18.74%.},
 type={Article},
 title={Application of Al 2O 3 ZnO, and TiO 2 ALD thin films as antireflection coating in the silicon solar cells},
 URL={http://journals.pan.pl/Content/129088/PDF-MASTER/OPELRE_2023_31_4_M_Szindler.pdf},
 doi={10.24425/opelre.2023.148223},
 keywords={optical thin film, antireflection coating, atomic layer deposition, solar cells},
}