Details

Title

Analysis Of The Underpotential Deposition Of Cadmium On Copper

Journal title

Archives of Metallurgy and Materials

Yearbook

2015

Issue

No 3 September

Authors

Divisions of PAS

Nauki Techniczne

Publisher

Institute of Metallurgy and Materials Science of Polish Academy of Sciences ; Committee of Materials Engineering and Metallurgy of Polish Academy of Sciences

Date

2015[2015.01.01 AD - 2015.12.31 AD]

Identifier

DOI: 10.1515/amm-2015-0284 ; e-ISSN 2300-1909

Source

Archives of Metallurgy and Materials; 2015; No 3 September

References

Leiva (1996), SPEC ISS, Electrochimica Acta, 14, 41. ; Oviedo (2015), Surf Sci, 0, 631. ; Colletti (1998), Journal of The Electrochemical Society, 5, 145. ; Kawamura (2002), Journal of The Electrochemical Society, 11, 149. ; Stuhlmann (1998), Electrochimica Acta, 6, 44. ; Budniok (1981), Journal of Electroanalytical Chemistry, 2, 123. ; Gregory (1991), Journal of Electroanalytical Chemistry, 300. ; Hsieh (2000), Langmuir, 16, 9501, doi.org/10.1021/la000808x ; Herrero (2001), Chemical Reviews, 7, 101. ; Lovell (1998), Electrochimica Acta, 14, 43. ; Oviedo (2014), in press, Surf Sci, doi.org/10.1016/j.susc.2014.08.020() ; Forni (2000), Electrochimica Acta, 20, 45. ; Hommrich (2002), Faraday Discussions, 121. ; Ge (1995), Surf Sci, 324. ; Hümann (2003), Thin Solid Films, 1, 428. ; Mech (2011), thin films deposited by DC magnetron sputtering for contact surfaces on electronic components of Mettalurgy and Materials, Cu Archives, 56. ; Sudha (2005), Journal of Chemical Sciences, 3, 117. ; Foresti (1998), Journal of Physical Chemistry B, 38, 102. ; Duda (2012), i, Nieżelazne, 9, 57.
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