Details

Title

Optimised magnetron sputtering method for the deposition of indium tin oxide layers

Journal title

Bulletin of the Polish Academy of Sciences Technical Sciences

Yearbook

2021

Volume

69

Issue

6

Authors

Affiliation

Musztyfaga-Staszuk, Małgorzata : Silesian University of Technology, Welding Department, ul. Konarskiego 18A, 44-100 Gliwice, Poland ; Pudiš, Dušan : Faculty of Faculty of Electrical Engineering and Information Technology, Department of Physics, Zilina, Slovakia ; Socha, Robert : Institute of Catalysis and Surface Chemistry, Polish Academy of Sciences, ul. Niezapominajek 8, 30-239 Krakow, Poland ; Gawlińska-Nęcek, Katarzyna : Institute of Metallurgy and Materials Science PAS, ul. Reymonta 25, 30-059 Krakow, Poland ; Panek, Piotr : Institute of Metallurgy and Materials Science PAS, ul. Reymonta 25, 30-059 Krakow, Poland

Keywords

In₂O₃ ; Sn₂O ; ITO ; magnetron sputtering method

Divisions of PAS

Nauki Techniczne

Coverage

e139005

Bibliography

  1.  L. Żukowska, J. Mikuła, M. Staszuk, and M. Musztyfaga-Staszuk, “Structure And Properties Of PVD Coatings Deposited On Cermets,” Arch. Metall. Mater., vol. 60, no. 2, pp. 727–733, 2015, doi: 10.1515/amm-2015-0198.
  2.  M. Staszuk et al., “Investigations of TiO2, Ti/TiO2, and Ti/TiO2/Ti/TiO2 coatings produced by ALD and PVD methods on Mg-(Li)-Al-RE alloys substrates,” Bull. Pol. Acad. Sci. Tech. Sci., vol. 69, no. 5, p. 137549, 2021 (in print), doi: 10.24425/bpasts.2021.137549.
  3.  Y.-S. Cho, M. Han, and S. H. Woo, “Electrospinning of Antimony Doped Tin Oxide Nanoparticle Dispersion for Transparent and Conductive Films,” Arch. Metall. Mater., vol. 65, no. 4, pp.  1345–1350, 2020, doi: 10.24425/amm.2020.133697.
  4.  R.A. Maniyara, V.K. Mkhitaryan, T.L. Chen, D.S. Ghosh, and V. Pruneri, “An antireflection transparent conductor with ultralow optical loss (<2%) and electrical resistance,” Nat. Commun., vol. 7, pp. 13771, 2016, doi: 10.1038/ncomms13771.
  5.  M. Kuc et al., “ ITO layer as an optical confinement for nitride edge-emitting lasers,” Bull. Pol. Acad. Sci. Tech. Sci., vol. 68, no. 1, 2020, doi: 10.24425/bpasts.2020.131834.
  6.  Y. Cui and C.M. Lieber, “Functional Nanoscale Electronic Devices Assembled Using Silicon Nanowire Building Blocks,” Science, vol. 291, pp. 851–853, 2001, doi: 10.1126/science.291.5505.851.
  7.  J. Kryłow, J. Oleński, Z. Sawicki, and A. Tumański, “Doping of semiconductors, Technological processes in semiconductor electronics,” Scientific and Technical Publishing House, Warsaw 1980 [in Polish].
  8.  Ş. Ţălu, S. Kulesza, M. Bramowicz, K. Stępień and D. Dastan, “Analysis of the Surface Microtexture of Sputtered Indium Tin Oxide Thin Films,” Arch. Metall. Mater., vol. 66, no. 2, pp.  443–450, 2021, doi: 10.24425/amm.2021.135877.
  9.  Y.S. Hsu and S.K. Gandhi, “The Effect of Phosphorus Doping on Tin Oxide Films Made by the Oxidation of Phosphine and Tetramethyltin II. Electrical Properties J. Electrochem. Soc. II,” Sol. State Sci. Technol., vol. 127, p. 1592, 1980.
  10.  T. Nakahara and H. Koda, Chemical Sensor Technology. Ed., N. Emazoe,” Elsevier, New York, 1991, vol. 3, p. 19.
  11.  S.-J. Hong, S.-H. Song, B.J. Kim, J.-Y. Lee, and Y.-S Kim, “ITO Nanoparticles Reused from ITO Scraps and Their Applications to Sputtering Target for Transparent Conductive Electrode Layer,” Nano Converg., vol. 4, no 23, p. 23, 2017.
  12.  Q. Li, E. Gao, and A.X. Wang, “Ultra-Compact and Broadband Electro-Absorption Modulator Using an Epsilon-near-Zero Conductive Oxide,” Photonics Res., vol. 6, no. 4, pp. 277–281, 2018, doi: 10.1364/PRJ.6.000277.
  13.  K. Ellmer, “Past Achievements and Future Challenges in the Development of Optically Transparent Electrodes,” Nat. Photonics, vol. 6, pp. 809–817, 2012, doi: 10.1038/nphoton.2012.282.
  14.  Q. Li et al., “3D ITO-Nanowire Networks as Transparent Electrode for All-Terrain Substrate,” Sci. Rep., vol.  9, no. 4983, 2019.
  15.  C. Guillén and J. Herrero, “Comparison study of ITO thin films deposited by sputtering at room temperature onto polymer and glass substrates,” Thin Solid Films, 480–481, pp. 129–132, 2005, doi: 10.1016/j.tsf.2004.11.040.
  16.  C. Guillén and J. Herrero, “Polycrystalline growth and recrystallisation process in sputtering ITO thin films,” Thin Solid Films, vol. 510, pp. 260–264, 2006.
  17.  H. Morikawa and M. Fujita, “Crystallisation and electrical property change on the annealing of amorphous indium-oxide and indium tin oxide films,” Thin Solid Films, vol. 359, pp. 61–67, 2000.
  18.  F. Kurdesau, G. Khripunov, A.F da Cunha, M Kaelin, and A.N Tiwari, “Comparative study of ITO layers deposited by DC and RF magnetron sputtering at room temperature,” J. Non-Crystall. Solids, vol. 352, pp. 1466–1470, 2006, doi: 10.1016/j.jnoncrysol.2005.11.088.
  19.  C.L. Tien, H.Y. Lin, C.K. Chang, and C.J. Tang, “Effect of Oxygen Flow Rate on the Optical, Electrical, and Mechanical Properties of DC Sputtering ITO Thin Films,” Adv. Condens. Matter Phys., 2019, p. 2647282, 2019.
  20.  J. Txintxurreta, E. G-Berasategui, R. Ortiz, O. Hernández, L. Mendizábal, and J. Barriga, “Indium Tin Oxide Thin Film Deposition by Magnetron Sputtering at Room Temperature for the Manufacturing of Efficient Transparent Heaters,” Coatings, vol. 11, p.  92, 2021, doi: 10.3390/coatings11010092.
  21.  R.K. Tyagi, P. Saxena, A. Vashisth, and S. Mehndiratta, “PVD based thin film deposition methods and characterisation/ property of different compositional coatings- a critical analysis,” Materials Today: Proceedings 2nd International Conference, vol.  38, pp. 259–264, 2020.
  22.  P. Sawicka-Chudy et al., “Characteristics of TiO2, Cu2O, and TiO2/Cu2O thin films for application in PV devices, AIP Advances, vol. 9, p. 055206, 2019, doi: 10.1063/1.5093037.
  23.  B. Wicher et al., “Structure and Electrical Resistivity Dependence of Molybdenum Thin Films Deposited by DC Modulated Pulsed Magnetron Sputtering,” Arch. Metall. Mater., vol. 63, no. 3, pp. 1339–1344, 2018, doi: 10.24425/123809.
  24.  L.J. Meng, E. Liang, J. Gao, V. Teixeira, and M.P. dos Santos, “Study of indium tin oxide thin films deposited on acrylics substrates by ion beam assisted deposition technique,” J. Nanosci. Nanotechnol., vol. 9, pp. 4151–4155, 2009, doi: 10.1166/jnn.2009.m24.
  25.  J.C. Manifacier, M. De Murcia, J.P. Fillard, and E. Vicario, “Optical and electrical properties of SnO2 thin films in relation to their stoichiometric deviation and their crystalline structure,” Thin Solid Films, vol. 41, pp. 127–144, 1977.
  26.  M. Iftikhar, I.M. Ali, and M.A. Al-Jenabi, “Structural and Optical Properties of In2O3 and Indium Tin Oxide Thin Films,” J. Unive. Anbar Pure Sci., vol. 11, no.1, pp.  39–46, 2017.
  27.  H. Kim et al., “Electrical, optical, and structural properties of indium-tin-oxide thin films for organic light-emitting devices,” J. Appl. Phys., vol. 86, pp. 6451–6461, 1999, doi: 10.1063/1.371708.
  28.  N. Nosidlak, “Application of polymer systems as materials in photovoltaic cells and electroluminescent diodes”. PhD Thesis, Krakow 2013.
  29.  L.F.J. Piper et al., “In2O3 is found about 2.8 eV below the Fermi level,” Appl. Phys. Lett., vol. 94, p. 022105, 2009.

Date

04.11.2021

Type

Article

Identifier

DOI: 10.24425/bpasts.2021.139005
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