Title

Analysis of the impact of post-process modifications on the properties of TiO₂ thin films with high-temperature stable anatase phase deposited by the electron beam evaporation method

Journal title

Opto-Electronics Review

Yearbook

2024

Volume

32

Issue

4

Affiliation

Obstarczyk, Agata : Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland ; Mańkowska, Ewa : Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland ; Weichbrodt, Wiktoria : Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland ; Kapuścik, Paulina : Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland ; Kijaszek, Wojciech : Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland ; Mazur, Michał : Faculty of Electronics, Photonics and Microsystems, Wroclaw University of Science & Technology, ul. Janiszewskiego 11/17, 50-372 Wroclaw, Poland

Authors

Obstarczyk, Agata ; Mańkowska, Ewa ; Weichbrodt, Wiktoria ; Kapuścik, Paulina ; Kijaszek, Wojciech ; Mazur, Michał

Keywords

post-process annealing ; electron beam evaporation ; TiO2 ; coating ; high-temperature stable anatase

Divisions of PAS

Nauki Techniczne

Coverage

e151991

Publisher

Polish Academy of Sciences (under the auspices of the Committee on Electronics and Telecommunication) and Association of Polish Electrical Engineers in cooperation with Military University of Technology

Date

15.10.2024

Type

Article

Identifier

DOI: 10.24425/opelre.2024.151991