Tytuł artykułu

The Al2O3/TiO2 double antireflection coating deposited by ALD method

Tytuł czasopisma

Opto-Electronics Review

Rocznik

2022

Wolumin

30

Numer

3

Autorzy

Szindler, Marek ; Szindler, Magdalena M. ; Orwat, Justyna ; Kulesza-Matlak, Grażyna

Afiliacje

Szindler, Marek : Scientific and Didactic Laboratory of Nanotechnology and Material Technologies, Faculty of Mechanical Engineering, Silesian University of Technology, 7 Towarowa St., 44-100 Gliwice, Poland ; Szindler, Magdalena M. : Department of Engineering Materials and Biomaterials, Silesian University of Technology, 18a Konarskiego St., 44-100 Gliwice, Poland ; Orwat, Justyna : Department of Mining, Safety Engineering and Industrial Automation, Silesian University of Technology, 2 Akademicka St., 44-100 Gliwice, Poland ; Kulesza-Matlak, Grażyna : Institute of Metallurgy and Materials Science of Polish Academy of Sciences, 25 Reymonta St., 30-059 Krakow, Poland

Słowa kluczowe

antireflection coating ; atomic layer deposition method ; solar cells

Wydział PAN

Nauki Techniczne

Zakres

e141952

Wydawca

Polish Academy of Sciences (under the auspices of the Committee on Electronics and Telecommunication) and Association of Polish Electrical Engineers in cooperation with Military University of Technology

Data

27.09.2022

Typ

Article

Identyfikator

DOI: 10.24425/opelre.2022.141952 ; ISSN 1896-3757

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